Both the lateral and vertical NbS2‐WS2 heterostructures are achieved here. The existence of the NbS2‐WS2 heterostructures is further manifested by electrical transport measurements. Find more information on the Altmetric Attention Score and how the score is calculated. Part of Springer Nature. https://doi.org/10.1007/978-3-642-32970-8, Structural Properties of Heterostructures, Electronic Properties of Heterostructures, Atomistic Aspects of Epitaxial Layer-Growth. This article is cited by
Here, we demonstrate epitaxial growth of 2D topological insulator, i.e., quantum spin Hall state, on Si(111) surface with a large energy gap, based on first-principles calculations. Two-step growth of VSe
,�)j The existence of the NbS2‐WS2 heterostructures is further manifested by electrical transport measurements. Herein, a robust epitaxial growth method is designed to construct multiple lattice-matched 2D metal–semiconductor TMDC vertical stacks (VSe2/MX2, M: Mo, W; X: S, Se) by a two-step chemical vapor deposition method. Please review prior to ordering.
This phenomenon was subsequently observed and described in detail by Alfred Y. Cho. Linear Dichroism and Nondestructive Crystalline Identification of Anisotropic Semimetal Few‐Layer MoTe
Oxygen-incorporated MoX (X: S, Se or P) nanosheets via universal and controlled electrochemical anodic activation for enhanced hydrogen evolution activity. <>
Electronic structure and magnetic properties of two-dimensional h-BN/Janus 2H-VSeX (X = S, Te) van der Waals heterostructures. P�M�ZY�P��K����.FC�Fk�s;������g�-�����n"�Sy��չ>\��Lܷ�=0��)�oh�|Κd
b��X�e� �k�#���������of�m~�nЅNF�� =�,���9�g�'�XG+uC��9�#�*��1�̍r]������i�)�9� ���"T��.SJ��`��8�G��ð��p���s1a�7�8���S\[ �4J�&χ���t��z#|�3f�H"+ƽ���.F�Jx!�A;~�1���*��4\����c}��x�o�8[ia����U�QͰ�F�~|�H�l�H/>��� Find more information about Crossref citation counts. Reduced Turn-On Voltage and Boosted Mobility in Monolayer WS2 Transistors by Mild Ar+ Plasma Treatment. A series of Er3+-activated SrLaGa3O7 single crystal fibers for mid-infrared laser application. Another technology, molecular-beam epitaxy (MBE), is mainly for compound semiconductors. The book covers the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and the description of the major growth techniques metalorganic vapor phase epitaxy, molecular beam epitaxy and liquid phase epitaxy. Heteroepitaxy represents the basis of advanced electronic and optoelectronic devices today and is considered one of the top fields in materials research. More importantly, the epitaxial growth of NbS2‐WS2 lateral metal‐semiconductor heterostructures via a “two‐step” CVD method is realized. 1 0 obj
Molecular-beam epitaxy (MBE) is an epitaxy method for thin-film deposition of single crystals.The MBE process was noticed in the late 1970s at Bell Telephone Laboratories by J. R. Arthur and J. J. LePore. The full text of this article hosted at iucr.org is unavailable due to technical difficulties. http://pubs.acs.org/page/copyright/permissions.html. Learn more. price for Spain
for high-performance photodetectors
vorgelegt der Mathematisch-Naturwissenschaftlich-Technischen Fakultät (mathematisch-naturwissenschaftlicher Bereich) der Martin-Luther-Universität Halle-Wittenberg von Herrn Zhang Zhang geb. Compound semiconductor epitaxial wafer provides faster switching at high power with increased energy efficiency and promotes improved performances.
Two-dimensional (2D) metal–semiconductor transition-metal dichalcogenide (TMDC) vertical heterostructures play a crucial role in device engineering and contact tuning fields, while their direct integration still challenging. without permission from the American Chemical Society. Both the lateral and vertical NbS 2 ‐WS 2 heterostructures are achieved here. endobj
Article Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. He has authored about 200 journal articles and conference papers, ten book contributions, and two patents, His current research interests include epitaxy and physics of semiconductor nanostructures and devices. 162.144.75.166. If you do not receive an email within 10 minutes, your email address may not be registered, Approaching ohmic contact to two-dimensional semiconductors.
nanosheets discovered by temperature-dependent Raman spectra. Cubic semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures and processes during nucleation and growth are treated in detail. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Learn about our remote access options, CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing, 100190 China, University of Chinese Academy of Science, No.19A Yuquan Road, Beijing, 100049 China, State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 610054 China, key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190 China. 2 Broken-Gap Type-III Band Alignment in WTe2/HfS2 van der Waals Heterostructure. Intriguingly, the metallic VSe2 preferred to nucleate and extend from the energy-favorable edge site of the semiconducting MX2 underlayer to form VSe2/MX2 vertical … Citations are the number of other articles citing this article, calculated by Crossref and updated daily. If you have previously obtained access with your personal account, �WW�ņu��}�mu����g��W������j�5̃�Cu��RN��D&ͼ�:m`� ��E�uW��� �`���܂�vek`��"Z#��5�5�Y5���n��lq_��T��-`O��%X��T�.>nV�0k�}J�2��"�cm����6�P�}��p��_2��������ʨK�s/��v�?�ð�4�;�ۦ�ͦF��Z5B����K}?B��tJ�G~o�`�̈́�kna�iӥ@X�-�9 �P��#�{2�|������^��(2ז�aߑ�� Yipeng An, Yusheng Hou, Kun Wang, Shijing Gong, Chunlan Ma, Chuanxi Zhao, Tianxing Wang, Zhaoyong Jiao, Heyan Wang, Ruqian Wu. Transmission electron microscopy studies reveal a clear chemical modulation with distinct interfaces.
In silicon wafer processing for semiconductor applications, epitaxy plays an important role. Heteroepitaxy represents the basis of advanced electronic and optoelectronic devices today and is considered one of the top fields in materials research. �
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The book covers the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and the description of the major growth techniques metalorganic vapor phase epitaxy, molecular beam epitaxy and liquid phase epitaxy. and you may need to create a new Wiley Online Library account.
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In particular, the formation of Schottky-diode or Ohmic contact-type band alignments was detected for the stacks between VSe2 and p-type WSe2 or n-type MoSe2, respectively.
Journal of the American Chemical Society. (Diploma) and Ph.D. degrees from the Technical University of Berlin, Berlin, Germany, in 1983 and 1988, respectively, all in physics. Use the link below to share a full-text version of this article with your friends and colleagues.
Vapor phase growth of two-dimensional PdSe2 nanosheets for high-photoresponsivity near-infrared photodetectors.
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9����_��&W�H�?��%F2Z���21yJ���od� Junfeng Hou, Congming Ke, Jiajun Chen, Baofan Sun, Yuanzheng Xia, Xu Li, Ting Chen, Yaping Wu, Zhiming Wu. Any queries (other than missing content) should be directed to the corresponding author for the article. . �������D��S~U͖s���M�:>��vn��P
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`H������[��xD���ۄ��ST��Ġ�E���+~��ЄJ�j�f�+�WȄ ��2����s�q���X���,X�M]{2�vq�h$p�N0�7�����FlQ�Kiy;���du(�1���v{��h�:��+�Awt!BP�>)���>'�lc���.��j�����b�L:ed����w� Towards scalable van der Waals heterostructure arrays. Salt-assisted chemical vapor deposition of two-dimensional materials. Synthesis and Transport Properties of Degenerate P-type Nb-doped WS2 Monolayers.
This is a modification of chemical vapor deposition (CVD). ��zw�Tvy��Z,�_Rr�C#�'0���-�ʾ����������2o������K��~���-2�>�F�K�T�hs�������a���� 3 Not affiliated SAE can be executed in various epitaxial growth methods such as molecular beam epitaxy (MBE), metalorganic vapour phase epitaxy (MOVPE) and chemical beam epitaxy (CBE). ) and their Band-Alignments
Epitaxial growth usually refers to growing of a single-crystal film on electrically insulating or metallic substrates that have good lattice matching with graphene [53]. Use the link below to share a full-text version of this article with your friends and colleagues. Functional hetero-interfaces in atomically thin materials.
Tao Yang, Xing Li, Liming Wang, Yiming Liu, Kaijian Chen, Xun Yang, Lei Liao, Lin Dong, Chong-Xin Shan. Ultrathin Magnetic 2D Single‐Crystal CrSe. In this article, we will discuss to you what epitaxial growth is and why it is important in semiconductor manufacturing. Jia Li, Xiangdong Yang, Yang Liu, Bolong Huang, Ruixia Wu, Zhengwei Zhang, Bei Zhao, Huifang Ma, Weiqi Dang, Zheng Wei, Kai Wang, Zhaoyang Lin, Xingxu Yan, Mingzi Sun, Bo Li, Xiaoqing Pan, Jun Luo, Guangyu Zhang, Yuan Liu, Yu Huang, Xidong Duan, Xiangfeng Duan.
For permission to reproduce, republish and 2D metal‐semiconductor heterostructures based on transition metal dichalcogenides (TMDs) are considered as intriguing building blocks for various fields, such as contact engineering and high‐frequency devices. Epitaxy, the process of growing a crystal of a particular orientation on top of another crystal, where the orientation is determined by the underlying crystal. Students of natural sciences, materials science and electrical engineering as well as their lecturers benefit from elementary introductions to theory and practice of epitaxial growth, supported by pertinent references and over 200 detailed illustrations.
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